Publication

Byline

Location

US Patent Issued to Samsung Display, LTC on July 14 for "Photosensitive resin composition and manufacturing method of display device using the same" (South Korean Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,385, issued on July 14, was assigned to Samsung Display Co. Ltd. (Yongin-si, South Korea) and LTC Co. Ltd (Hwaseong-si, South Korea). "Phot... और पढ़ें


US Patent Issued to RESONAC on July 14 for "Photosensitive resin composition, dry film, printed wiring board, and method for producing printed wiring board" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,386, issued on July 14, was assigned to RESONAC Corp. (Tokyo). "Photosensitive resin composition, dry film, printed wiring board, and metho... और पढ़ें


US Patent Issued to SAMSUNG ELECTRONICS on July 14 for "Photoresist compositions for EUV and methods for manufacturing semiconductor devices using the same" (South Korean Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,387, issued on July 14, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea). "Photoresist compositions for EUV and methods... और पढ़ें


US Patent Issued to SHIN-ETSU CHEMICAL on July 14 for "Positive resist composition and pattern forming process" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,388, issued on July 14, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Positive resist composition and pattern forming process" was ... और पढ़ें


US Patent Issued to NISSAN CHEMICAL on July 14 for "EUV resist underlayer film-forming composition" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,389, issued on July 14, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "EUV resist underlayer film-forming composition" was invented by Sho... और पढ़ें


US Patent Issued to Carl Zeiss SMT on July 14 for "Component of an optical system" (German Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,390, issued on July 14, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Component of an optical system" was invented by Matthia... और पढ़ें


US Patent Issued to National Cheng Kung University on July 14 for "Cyclic exposure scanning system having distributed multi-lens and method thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,392, issued on July 14, was assigned to National Cheng Kung University (Tainan, Taiwan). "Cyclic exposure scanning system having distribute... और पढ़ें


US Patent Issued to ASML Netherlands on July 14 for "System and method for conditioning optical apparatuses" (Dutch Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,393, issued on July 14, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "System and method for conditioning optical apparat... और पढ़ें


US Patent Issued to Canon on July 14 for "Temperature adjustment apparatus, lithography apparatus, and article manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,394, issued on July 14, was assigned to Canon K.K. (Tokyo). "Temperature adjustment apparatus, lithography apparatus, and article manufactu... और पढ़ें


US Patent Issued to CANON on July 14 for "Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,395, issued on July 14, was assigned to CANON K.K. (Tokyo). "Electrophotographic photosensitive member, process cartridge, and electrophoto... और पढ़ें